High-repetition-rate ArF excimer laser for microlithography
- 著者名:
Wakabayashi,O. Enami,T. Ishii,K. Terashima,K. Itakura,Y. Watanabe,T. Ohta,T. Ohbu,A. Kubo,H. Tanaka,H. Andou,S. Matsunga,T. Umeda,H. Suzuki,T. Sumitani,A. Mizoguchi,H. - 掲載資料名:
- First International Symposium on Laser Precision Microfabrication : 14-16 June 2000, Omiya, Saitama, Japan
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4088
- 発行年:
- 2000
- 開始ページ:
- 191
- 終了ページ:
- 194
- 総ページ数:
- 4
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819437310 [081943731X]
- 言語:
- 英語
- 請求記号:
- P63600/4088
- 資料種別:
- 国際会議録
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1
国際会議録
Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |