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Influence of rf power on carbon nitride films prepared by rf magnetron sputtering

著者名:
掲載資料名:
Fourth International Conference on Thin Film Physics and Applications : 8-11 May 2000, Shanghai, China : proceedings
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4086
発行年:
2000
開始ページ:
540
終了ページ:
543
総ページ数:
4
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437297 [0819437298]
言語:
英語
請求記号:
P63600/4086
資料種別:
国際会議録

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