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Effects of local crystallography on stress-induced voiding in passivated copper interconnects.

著者名:
掲載資料名:
Electron crystallography
シリーズ名:
NATO ASI series. Series E, Applied sciences
シリーズ巻号:
347
発行年:
1997
開始ページ:
379
終了ページ:
382
総ページ数:
4
出版情報:
Dordrecht: Kluwer Academic Publishers
ISSN:
0168132X
ISBN:
9780792348764 [0792348761]
言語:
英語
請求記号:
N11482/347
資料種別:
国際会議録

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