Ultrathin NO/N2O oxynitride dielectric for advanced flash memory application: Single wafer and batch technology
- 著者名:
Zonca, R. Crivelli, B. Polignano, M. L. Cazzaniga, F. Alessandri, M. Caricato, A. P. Bersani, M. Sbetti, M. Vanzetti, L. Xing, G. C. Miner, G. E. Astici, N. Kuppurao, S. Lopes, D. Nesso, S. - 掲載資料名:
- Structure and electronic properties of ultrathin dielectric films on silicon and related structures : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 592
- 発行年:
- 2000
- 開始ページ:
- 141
- 出版情報:
- Warrendale, PA: MRS-Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558995000 [1558995005]
- 言語:
- 英語
- 請求記号:
- M23500/592
- 資料種別:
- 国際会議録
類似資料:
MRS-Materials Research Society |
Electrochemical Society |
MRS - Materials Research Society |
MRS - Materials Research Society |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
10
国際会議録
Characterization of a Thermal Oxidation Process on SiC Preamorphized by Ar Ion Implantation
Trans Tech Publications |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Materials Research Society |