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Polymers of α-Substituted Benzyl Methacrylates and Aliphatic Aldehydes as New Types of Electron-Beam Resists

著者名:
Hatada, K.
Kitayama, T.
Okamoto, Y.
Yuki, H.
Aritome, H.
Namba, S.
Nate, K.
Inoue, T.
Yokono, H.
さらに 4 件
掲載資料名:
Materials for microlithography : radiation-sensitive polymers
シリーズ名:
ACS symposium series
シリーズ巻号:
266
発行年:
1984
開始ページ:
399
出版情報:
Washington, D.C.: American Chemical Society
ISSN:
00976156
ISBN:
9780841208711 [0841208719]
言語:
英語
請求記号:
A05800/266
資料種別:
国際会議録

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