CHEMICAL STABILITY OF REACTIVELY SPUTTERED AlN WITH PLASMA ENHANCED CHEMICAL VAPOR DEPOSITED SiO2 AND SiNx

CHEMICAL STABILITY OF REACTIVELY SPUTTERED AlN WITH PLASMA ENHANCED CHEMICAL VAPOR DEPOSITED SiO2 AND SiNx

著者名:

掲載資料名:

Polycrystalline thin films : structure, texture, properties, and applications : symposium held April 4-8, 1994, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

343

発行年:

1994

開始ページ:

253

出版情報:

Pittsburgh, PA: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992436 [155899243X]

言語:

英語

請求記号:

M23500/343

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020769
シリーズID:	PA00000011
会議名:	Symposium on polycrystalline thin films
回次:	1994
会議開催地:	San Francisco, CA, USA
会議開催年:	1994.04.04-1994.04.08

類似資料:

1 国際会議録 IMPROVEMENT IN THE ACTIVATION EFFICIENCY OF IMPLANTED Si IN GaAs USING OXYGEN PLASMA PRETREATMENT Cho, Jaeshin, Pawlowicz, Leszek M., Saha, Naresh C. Materials Research Society	7 国際会議録 White photoluminescence from SiNx films prepared by plasma enhanced chemical vapor deposition [6337-31] Kang, Z. T., Wagner, B. K., Parrish, J., Summers, C. J. SPIE - The International Society of Optical Engineering
2 国際会議録 Plasma-Enhanced Chemical Vapor Deposited SiNx and SiO2 Passivation Effects on ZnO Heterojunction Light Emitting Diodes Y. Wang, H. Kim, D.P. Norton, S.J. Pearton, F. Ren Electrochemical Society	8 国際会議録 Structural and optical properties of TiO2-SiO2 composite films deposited by chemical vapor deposition at low-SiO2-conetnt region Park,J.-H., Cho,W.-J., Hong,K.-S. SPIE-The International Society for Optical Engineering
3 国際会議録 Kinetics Investigation of Remote Plasma-Enhanced Chemical Vapor Deposition of SiO2 Courtney, C.H., Lamb, H.H. Electrochemical Society	9 国際会議録 CHARACTERIZATION OF SPUTTERED Ge FILM Cho, Jaeshin, Theodore, N. David MRS - Materials Research Society
4 国際会議録 Characterization of a-SiNx Thin Film Deposited by Inductively-Coupled Plasma-Enhanced Chemical Vapor Deposition Han, Sang-Soo, Jun, Byung-Hyuk, No, Kwangsoo, Bae, Byeong-Soo MRS - Materials Research Society	10 国際会議録 Stress Hysteresis and Mechanical Characterization of Plasma-Enhanced Chemical Vapor Deposited Dielectrics Thurn, Jeremy, Cook, Robert F., Kamarajugadda, Mallika, Stearns, Laura C. Materials Research Society
5 国際会議録 STABILITY OF SPUTTER DEPOSITED A1-Cu BILAYERS ON SiO2 Nandan, R., Murarka, S. P., Pant, A., Shepard, C., Lanford, W. A. Materials Research Society	11 国際会議録 THE CHEMICAL INTERFACE OF MICROWAVE PLASMA DEPOSITED SiO2 FILMS Parks, C. C., Robinson, B., Leavy Jr., H. J., Childs, K. D., Coyle, Jr. G. J. Materials Research Society
6 国際会議録 Sticking Probability and Step Coverage Studies of SiO2 and Polymerized Siloxane Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition Theil, Jeremy A. MRS - Materials Research Society	12 国際会議録 Preparation of PZT Thin Films on Pt/Ti/SiO2 and Pt/SiO2 Substrates by ECR Plasma-Enhanced dc Magnetron Multitarget Reactive Sputtering Kim, Sung-Tae, Kim, Hyun-Ho, Lee, Moon-Yong, Lee, Won-Jong MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12