Plasma antireflective coating optimization using enhanced reflectivity modeling
- 著者名:
Lucas,K.D. ( Motorola ) Vasquez,J.A. Jain,A. Filipiak,S.M. Vuong,T. King,C.F. Roman,B.J. - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3050
- 発行年:
- 1997
- 開始ページ:
- 194
- 終了ページ:
- 204
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424648 [0819424641]
- 言語:
- 英語
- 請求記号:
- P63600/3050
- 資料種別:
- 国際会議録
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