Oxygen precipitation and denuded zone characterization with ELYMAT technique
- 著者名:
- Obermeier,G. ( Wacker Siltronic GmbH )
- Hage,J.
- Hilger,N.
- Huber,D.
- 掲載資料名:
- Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing II
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2638
- 発行年:
- 1995
- 開始ページ:
- 104
- 終了ページ:
- 112
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420046 [0819420042]
- 言語:
- 英語
- 請求記号:
- P63600/2638
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
7
国際会議録
Standardization of Characterization of Bulk Microdefects and Denuded Zones in Annealed CZ Si
Electrochemical Society |
Electrochemical Society |
8
国際会議録
Mechanical and Thermophysical Properties of Thin Film Materials for MEMS: Techniques and Devices
MRS - Materials Research Society |
Electrochemical Society |
Materials Research Society |
Electrochemical Society |
10
国際会議録
CHARACTERIZATION OF SINGLE AND POLYCRYSTALLINE SILICON BY EXTENSIONS OF THE ELYMAT TECHNIQUE
Electrochemical Society |
Trans Tech Publications |
11
国際会議録
Hydrogen Enhanced Thermal Donor Formation in p-Type Czochralski Silicon with a Denuded Zone
Electrochemical Society |
Electrochemical Society |
Trans Tech Publications |