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Real-time detection of chamber condition by observing the plasma spectrum intensity

著者名:
  • Cho,C.W. ( Taiwan Semiconductor Manufacturing Co. )
  • Hwang,Y.K. ( Taiwan Semiconductor Manufacturing Co. )
  • Chu,P.T. ( Taiwan Semiconductor Manufacturing Co. )
  • Peng,Y.S. ( Taiwan Semiconductor Manufacturing Co. )
  • Chen,C.H. ( Taiwan Semiconductor Manufacturing Co. )
掲載資料名:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3507
発行年:
1998
開始ページ:
237
終了ページ:
244
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429667 [081942966X]
言語:
英語
請求記号:
P63600/3507
資料種別:
国際会議録

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