Blank Cover Image

UV Laser Induced Oxidation of Silicon in Solid and Liquid Phase Regime

著者名:
掲載資料名:
Emerging technologies for in situ processing
シリーズ名:
NATO ASI series. Series E, Applied sciences
シリーズ巻号:
139
発行年:
1988
開始ページ:
249
終了ページ:
256
総ページ数:
8
出版情報:
Dordrecht: Martinus Nijihoff Publishers
ISSN:
0168132X
ISBN:
9789024737338 [9024737338]
言語:
英語
請求記号:
N11482/139
資料種別:
国際会議録

類似資料:

1 国際会議録 *LOW TEMPERATURE SYNTHESIS OF SILICON OXIDE AND OXYNITRIDE FILMS BY REACTIVE LASER ABLATION

Fogarassy, E., Fuchs, C., Slaoui, A., De Unamuno, S., Stoquert, J.-P., Marine, W., Lang, B.

Materials Research Society
7 国際会議録 PHOSPHORUS AND BORON DOPING OF SILICON THIN FILMS USING ArF EXCIMER LASER

Slaoui, A., Pattyn, H., Fogarassy, E., De Unamuno, S., Stuck, R.

Materials Research Society
2 国際会議録 COMPARISON OF THE PROCESSES INDUCED BY MERCURY LAMP AND ArF EXCIMER LASER PHOTOASSISTED CVD OF a-Si: H FILMS

Fuchs, C., Fogarassy, E.

Materials Research Society
8 国際会議録 ArF EXCIMER LASER DOPING INTO AMORPHOUS SILICON THIN FILMS

Elliq, M., Slaoui, A., Fogarassy, E., Pattyn, H., Struck, R., Siffert, P.

Materials Research Society
3 国際会議録 OPTICAL PROPERTIES OF LASER INDUCED HEAVILY DOPED SILICON LAYERS

Slaoui, A., Fogarassy, E., Siffert, P., Morphange, J. F., Balkanski, M.

North-Holland
9 国際会議録 BORON DOPING OF SILICON USING EXCIMER LASERS

Slaoui, A., Foulon, F., Bianconi, M., Correra, L., Nipoti, R., Stuck, R., Unamuno, S., Fogarassy, E., Nicoletti, S.

Materials Research Society
4 国際会議録 A COMPARISON OF THE GAS PHASE PROCESSES RESULTING FROM SiH4 AND Si2H6 PHOTODISSOCIATION WITH A PULSED ArF EXCIMER LASER

Boch, E., Fuchs, C., Fogarassy, E., Siffert, P.

Materials Research Society
10 国際会議録 PULSED EXCIMER LASER DEPOSITION OF YBaCuO AND BiSrCaCuO COMPOUNDS: MATERIAL DISTRIBUTION AND STOICHIOMETRY

Fuchs, Claude, Fogarassy, Eric

Materials Research Society
5 国際会議録 LASER INDUCED OXIDATION OF HEAVILY DOPED SILICON

Fogarassy, F., White, C.W., Lowndes, D.H., Narayan J.

Materials Research Society
11 国際会議録 PICOSECOND LASER-INDUCED SOLID-LIQUID PHASE TRANSFORMATIONS IN GALLIUM ARSENIDE AND SILICON

Danielzik, B., Harten, P., Sokolowski-Tinten, K., von der Linde

Materials Research Society
6 国際会議録 PHOSPHORUS DOPING INTO SILICON USING ArF EXCIMER LASER

Slaoui, Abdelilah, Foulon, Francois, Fogarassy, Eric, Siffert, Paul

Materials Research Society
12 国際会議録 Excimer laser induced crystallization of amorphous silicon-germanium films

Slaoui, A., Deng, C., Talwar, S., Kramer, J. K., Prevot, B., Sigmon, T. W.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12