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Epitaxial NiSi2 and CoSi2 Interfaces

著者名:
掲載資料名:
Evaluation of advanced semiconductor materials by electron microscopy
シリーズ名:
NATO ASI series. Series B, Physics
シリーズ巻号:
203
発行年:
1989
開始ページ:
167
終了ページ:
181
総ページ数:
15
出版情報:
New York: Plenum Press
ISBN:
9780306433627 [0306433621]
言語:
英語
請求記号:
N11479/203
資料種別:
国際会議録

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