A novel integrated MEMS process using fluorocarbon films deposited with a deep reactive ion etching (DRIE) tool
- 著者名:
Ayon, A. A. Chen, D-Z. Khanna, R. Braff, R. Sawin, H. H. Schmidt, M. A. - 掲載資料名:
- Materials science of microelectromechanical systems (MEMS) devices II : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 605
- 発行年:
- 2000
- 開始ページ:
- 141
- 出版情報:
- Warrendale, Pa.: MRS-Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558995130 [1558995137]
- 言語:
- 英語
- 請求記号:
- M23500/605
- 資料種別:
- 国際会議録
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6
国際会議録
Characterization and Modeling of Wafer and Die Level Uniformity in Deep Reactive Ion Etching (DRIE)
Materials Research Society |
Trans Tech Publications |