Deposition and characterization of in situ boron doped polycrystalline silicon films for microelectromechanical systems applications

Deposition and characterization of in situ boron doped polycrystalline silicon films for microelectromechanical systems applications

著者名:

掲載資料名:

Materials science of microelectromechanical systems (MEMS) devices II : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

605

発行年:

2000

開始ページ:

31

出版情報:

Warrendale, Pa.: MRS-Materials Research Society

ISSN:

02729172

ISBN:

9781558995130 [1558995137]

言語:

英語

請求記号:

M23500/605

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020366
シリーズID:	PA00000011
会議名:	Materials Science of Microelectromechanical Systems (MEMS) Devices : Symposium
回次:	2nd
会議開催地:	Boston, MA, USA
会議開催年:	1999.11.29-1999.12.01

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