Soluble Polysilanes in Photolithography | 東京工業大学附属図書館文献データベース

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Soluble Polysilanes in Photolithography

著者名:

Sooriyakumaran, R.

さらに 3 件

掲載資料名:

Polymers for high technology : electronics and photonics

シリーズ名:

ACS symposium series

シリーズ巻号:

346

発行年:

1987

開始ページ:

170

出版情報:

Washington, DC: American Chemical Society

ISSN:

00976156

ISBN:

9780841214064 [0841214069]

言語:

英語

請求記号:

A05800/346

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020336
シリーズID:	PA00000004
会議名:	Meeting of the American Chemical Society
回次:	192nd
会議開催地:	Anaheim, CA, USA
会議開催年:	1986.09.07-1986.09.12

類似資料:

1 国際会議録 Soluble Polysilane Derivatives: Chemistry and Spectroscopy Miller, R. D., Rabolt, J. F., Sooriyakumaran, R., Fleming, W., Fickes, G. N., Farmer, B. L., Kuzmany, H. American Chemical Society	7 国際会議録 Protecting groups for 193-nm photoresists Allen,R.D., Sooriyakumaran,R., Opitz,J., Wallraff,G.M., DiPietro,R.A., Breyta,G., Hofer,D.C., Kunz,R.R., Jayaraman,S., … SPIE-The International Society for Optical Engineering
2 国際会議録 Soluble Polysilane Derivatives: Interesting New Radiation-Sensitive Polymers Miller, R. D., Hofer, D., McKean, D. R., Willson, C. G., West, R., Trefonas, P. T., III American Chemical Society	8 国際会議録 High-resolution 248-nm bilayer resist Lin, Q., Petrillo, K. E., Babich, K., Tulipe, D. C. La, Medeiros, D., Mahorowala, A., Simons, J. P., Angelopoulos, M., … SPIE - The International Society of Optical Engineering
3 国際会議録 Radiolysis of Poly(isopropenyl t-butyl ketone) MacDonald, S. A., Ito, H., Willson, C. G., Moore, J. W., Gharapetian, H. M., Guillet, J. E. American Chemical Society	9 国際会議録 Approaches to etch-resistant 193-nm photoresists: performance and prospects Allen, R. D., Opitz, J., Ito, H., Wallow, T. I., Casmier, D. V., DiPietro, R. A., Brock, P. J., Breyta, G., … SPIE - The International Society of Optical Engineering
4 国際会議録 Nonlinear Optical Properties of Substituted Polysilanes and Polygermanes Miller, R. D., Schellenberg, F. M., Baumert, J.-C., Looser, H., Shukla, P., Torruellas, W., Bjorklund, G. C., Kano, S., … American Chemical Society	10 国際会議録 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers Sooriyakumaran,R., Fenzel-Alexander,D., Brock,P.J., Larson,C.E., DiPietro,R.A., Wallraff,G.M., Hofer,D.C., Dawson,D.J., … SPIE - The International Society for Optical Engineering
5 国際会議録 New single-layer positive photoresists for 193-nm photolithography Okoroanyanwu,U., Shimokawa,T., Byers,J.D., Medeiros,D.R., Willson,C.G., Niu,Q.J., Frechet,J.M.J., Allen,R.D. SPIE-The International Society for Optical Engineering	11 国際会議録 Design and study of water-soluble positive- and negative-tone imaging materials Havard,J.M., Pasini,D., Frechet,J.M.J., Medeiros,D.R., Patterson,K., Yamada,S., Willson,C.G. SPIE-The International Society for Optical Engineering
6 国際会議録 Design of a positive-tone water-soluble resist Havard,J.M., Frechet,J.M.J., Pasini,D., Mar,B., Yamada,S., Medeiros,D.R., Willson,C.G. SPIE-The International Society for Optical Engineering	12 国際会議録 Dissolution inhibitors for 157-nm photolithography Chambers, C.R., Kusumoto, S., Lee, G.S., Vasudev, A., Walthal, L., Osborn, B.P., Zimmerman, P., Conley, W.E., Willson, … SPIE-The International Society for Optical Engineering

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