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ARSENIC DIFFUSION AND SEGREGATION BEHAVIOR AT THE INTERFACE OF EPITAXIAL CoSi2 FILM AND Si SUBSTRATE

著者名:
掲載資料名:
Silicides, germanides, and their interfaces : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
320
発行年:
1994
開始ページ:
409
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992191 [1558992197]
言語:
英語
請求記号:
M23500/320
資料種別:
国際会議録

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