Blank Cover Image

ELECTRICAL CHARACTERISATION OF EPITAXIAL (100) CoSi2/Si CONTACTS OBTAINED USING A Ti/Co BILAYER

著者名:
Lauwers, A.
Vercaemst, A.
Hove, M. Van
Larsen, K. Kyllesbech
Verbeeck, R.
Meirhaeghe, R. Van
Maex, K.
Rossum, M. Van
さらに 3 件
掲載資料名:
Silicides, germanides, and their interfaces : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
320
発行年:
1994
開始ページ:
59
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992191 [1558992197]
言語:
英語
請求記号:
M23500/320
資料種別:
国際会議録

類似資料:

1 国際会議録 FORMATION OF β- AND α-FeSi2 FILMS ON (100) SILICON USING Fe-Si AND Fe-Ti-Si DIFFUSION COUPLES

Larsen, K. Kyllesbech, Lauwers, A., Maex, K., Rossum, M. Van

MRS - Materials Research Society
7 国際会議録 Formation of Deep Sub-Micrometer Cobalt Silicided Poly Gate Using Bilayer Processes

Wang, Q.F., Lauwers, A., Deweerdt, B., Verbeeck, R., Maex, K.

Electrochemical Society
2 国際会議録 ELECTRIC AND MAGNETIC TRANSPORT IN ION-BEAM SYNTHESISED α-FeSi2

Larsen, K. Kyllesbech, Hove, M. Van, Lauwers, A., Maex, K., Rossum, M. Van

MRS - Materials Research Society
8 国際会議録 The Influence of Ti Capping Layers on CoSi2 Formation in the Presence of Interfacial Oxide

Detavernier, C., Donaton, R. A., Maex, K., Jin, S., Bender, H., Meirhaeghe, R. Van, Cardon, F.

MRS - Materials Research Society
3 国際会議録 FORMATION OF BURIED α- AND β-FeSi2 IN (100) Si BY HIGH DOSE ION IMPLANTATION

Maex, K., Lauwers, A., Van Hove, M., Vandervorst, W., Van Rossum, M.

Materials Research Society
9 国際会議録 AMORPHOUS PHASE FORMATION DURING ION MIXING OF Ti/Si BILAYERS AT ELEVATED TEMPERATURE

Maex, K., De Keersmaecker, R. F., Van Rossum, M., van der Weg, W. F.

Materials Research Society
4 国際会議録 A Study On (CO1-xNIxSI2) Schottky Contacts On N-SI(100) Substrates

Qu, Xin-Ping, Detavernier, C., Van Meirhaeghe, R.L., Cardon, F., Lauwers, A., Maex, K., Li, Bing-Zong

Electrochemical Society
10 国際会議録 Structural and Electrical Characterization of FeSix-Layers (1｡蛉｡？) Prepared by RTP of Fe Layers Sputtered on Si (100)

Libezny, M., Poortmans, J., Amesz, P. H., Donaton, R. A., Larsen, K. Kyllesbech, Vandenabeele, P., Jonckx, F., Maex, K., …

MRS - Materials Research Society
5 国際会議録 CoSi2 Formation Using a Ti Capping Layer - The Influence of Processing Conditions on CoSi2 Nucleation

Detavernier, C., Meirhaeghe, R.L. Van, Maex, K.

Materials Research Society
11 国際会議録 Epitaxial CoSi2 Formation by a Cr or Mo Interlayer

Detavernier, Christophe, Van Meirhaeghe, Roland L., Cardon, Felix, Maex, K., Brijs, B., Vandervorst, W.

Materials Research Society
6 国際会議録 The Influence of Ti and TiN on the Thermal Stability of CoSi2

Detavernier, C., Ru, Guo-Ping, Meirhaeghe, R.L. Van, Maex, K.

Materials Research Society
12 国際会議録 Formation of Epitaxial CoSi2 Layers Grown from the Interaction of Co/Ti Bilayers with Si<100> Substrates

Cardenes, J., Zhang, S-L., Svensson, B. G., Petersson, C. S.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12