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Time-Dependent Dielectric Breakdown in Thin Intrinsic SiO2 Films

著者名:
掲載資料名:
Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
386
発行年:
1995
開始ページ:
227
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992894 [1558992898]
言語:
英語
請求記号:
M23500/386
資料種別:
国際会議録

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