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Photo-Induced CVD of Tantalum Pentoxide Dielectric Films Using an Injection Liquid Source

著者名:
Zhang, J-Y.
Boyd, I. W.
Mooney, M. B.
Hurley, P. K.
O'Sullivan, B. J.
Beechinor, J. T.
Kelly, P. V.
Crean, G. M.
Senateur, J-P.
さらに 4 件
掲載資料名:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
567
発行年:
1999
開始ページ:
397
出版情報:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994744 [1558994742]
言語:
英語
請求記号:
M23500/567
資料種別:
国際会議録

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