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Soft Breakdown in Ultrathin Oxides

著者名:
Weir, B. E.
Silverman, P. J.
Alers, G. B.
Monroe, D.
Alam, M. A.
Sorsch, T. W.
Green, M. L.
Timp, G. L.
Ma, Y.
Frei, M.
Liu, C. T.
Bude, J. D.
Krisch, K. S.
さらに 8 件
掲載資料名:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
567
発行年:
1999
開始ページ:
301
出版情報:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994744 [1558994742]
言語:
英語
請求記号:
M23500/567
資料種別:
国際会議録

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