The Influence of Electrons From the Filament on the Material Properties of Hydrogenated Amorphous Silicon Growth by the Hot-Wire Chemical Vapor Deposition Technique

The Influence of Electrons From the Filament on the Material Properties of Hydrogenated Amorphous Silicon Growth by the Hot-Wire Chemical Vapor Deposition Technique

著者名:

掲載資料名:

Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14-17, 1998, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

507

発行年:

1999

開始ページ:

927

出版情報:

Warrendale: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994133 [1558994130]

言語:

英語

請求記号:

M23500/507

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020313
シリーズID:	PA00000011
会議名:	Symposium on amorphous and microcrystalline silicon technology
回次:	1998
会議開催地:	San Francisco, CA, USA
会議開催年:	1998.04.14-1998.04.17

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