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Refinement of PLAS Samples by Using AFM Image and First Observation of PLAS Signals on Amorphous Carbon Nitride a-CNx Films

著者名:
Furukawa, H.
Nitta, S.
Hioki, M.
Iwasaki, T.
Itoh, T.
Nonomura, S.
さらに 1 件
掲載資料名:
Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14-17, 1998, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
507
発行年:
1999
開始ページ:
465
出版情報:
Warrendale: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994133 [1558994130]
言語:
英語
請求記号:
M23500/507
資料種別:
国際会議録

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