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The Effect of Strain Relaxation Mechanisms on the Electrical Properties of Epitaxial CaF2/Si(111) Heterostructures

著者名:
掲載資料名:
Atomic resolution microscopy of surfaces and interfaces : symposium held December 3-5, 1996, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
466
発行年:
1997
開始ページ:
21
出版情報:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993709 [1558993703]
言語:
英語
請求記号:
M23500/466
資料種別:
国際会議録

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