Hot-Wire Deposited Amorphous Silicon Thin-Film Transistors

Hot-Wire Deposited Amorphous Silicon Thin-Film Transistors

著者名:

掲載資料名:

Flat panel display materials II : symposium held April 8-12, 1996, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

424

発行年:

1997

開始ページ:

31

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993273 [1558993274]

言語:

英語

請求記号:

M23500/424

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020305
シリーズID:	PA00000011
会議名:	Symposium on flat panel display materials
回次:	2nd
会議開催地:	San Francisco, CA, USA
会議開催年:	1996.04.08-1996.04.12

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1 国際会議録 Hot-Wire Deposited Amorphous Silicon Thin-Film Transistors Schropp, R. E. I., Feenstra, K. F., Werf, C. H. M. van der, Holleman, J., Meiling, H. MRS - Materials Research Society	7 国際会議録 Transistors With a Profiled Active Layer Made by Hot-Wire CVD Meiling, H., Brockhoff, A. M., Rath, J. K., Schropp, R. E. I. MRS - Materials Research Society
2 国際会議録 Thin-Film Transistors Based on Hot-Wire Amorphous Silicon on Silicon Nitride Brockhoff, A. M., Meiling, H., Schropp, R. E. I., Stannowski, B. Materials Research Society	8 国際会議録 Material Properties of Hot-Wire Deposited Silicon TFTs Brockhoff, A.M., Meiling, H., Habraken, F. H. P. M., Schropp, R. B. I. Electrochemical Society
3 国際会議録 Hot-Wire CVD Poly-Silicon Films for Thin-Film Devices Rath, J. K., Tichelaar, F. D., Meiling, H., Schropp, R. E. I. MRS - Materials Research Society	9 国際会議録 Low Temperature Poly-Si Layers Deposited By Hot Wire CVD Yielding A Mobility Of 4.0 cmW1 In Top Gate Thin Film Transistors Chen, Y., Rath, J. K., Schropp, R. E. I., Stannowski, B., vanderWerf, C. H. M., Wagner, S. Materials Research Society
4 国際会議録 Purely Intrinsic Polysilicon Films by Hot-Wire Chemical Vapor Deposition Rath, J. K., Feenstra, K. F., Ruff, D., Meiling, H., Schropp, R. E. I. MRS - Materials Research Society	10 国際会議録 Process Parameters for Poly-Silicon Deposition at a High Growth Rate (1-7nm/s) by Hot-Wire Chemical Vapor Deposition Rath, J. K., Hardeman, A. J., Werf, C. H. M. van der, Veenendaal, P. A. T. T. van, Rusche, M. Y. S., Schropp, R. E. I. Materials Research Society
5 国際会議録 Thin Film a-Si/poly-Si Multibandgap Tandem Solar Cells With Both Absorber Layers Deposited by Hot Wire CVD Schropp, R.E.I., Werf, C.H.M. Van Der, Veen, M.K. Van, Veenendaal, P.A.T.T. Van, Zambrano, R. Jimenez, Hartman, Z., … Materials Research Society	11 国際会議録 Towards an All-Hot-Wire TFT: Silicon Nitride and Amorphous Silicon Deposited by Hot-Wire Chemical Vapor Deposition Stannowski, B., Veen, M.K. van, Schropp, R.E.I. Materials Research Society
6 国際会議録 Transistors With a Profiled Active Layer Made by Hot-Wire CVD Meiling, H., Brockhoff, A. M., Rath, J. K., Schropp, R. E. I. MRS - Materials Research Society	12 国際会議録 Oxygenated Protocrystalline Silicon Thin Films for Wide Bandgap Solar Cells R.E.I. Schropp, J.W. Schüttauf, C.H.M. van der Werf Materials Research Society

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