Thin Ti/TiN Barriers for ULSI Application

Thin Ti/TiN Barriers for ULSI Application

著者名:

掲載資料名:

Polycrystalline thin films II : structure, properties, and applications : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

403

発行年:

1996

開始ページ:

495

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993068 [1558993061]

言語:

英語

請求記号:

M23500/403

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020303
シリーズID:	PA00000011
会議名:	Symposium on polycrystalline thin films
回次:	2nd
会議開催地:	Boston, MA, USA
会議開催年:	1995.11.27-1995.12.01

類似資料:

1 国際会議録 MOCVD-TiN BARRIER LAYERS FOR ULSI APPLICATIONS Raaijmakers Ivo J., Vrtis, Raymond N., Yang, Jack, Ramaswami, Seshadri, Legendijk, Andre, Roberts, David A., Broadbent, … Materials Research Society	7 国際会議録 Ti-Salicide Improvement by Preamorphization for ULSI Applications Chen, Chun-Cho, Wang, Q. F., Jonckx, Franky, Jenq, Jyh-Shyang, Maex, Karen MRS - Materials Research Society
2 国際会議録 Ti/TiN Barrier Improvement for VLSI Metallization Chen, Chun-Cho, Chao, Jay L. C., Wang, K. C., Chiang, Eric, Hsu, J. J. MRS - Materials Research Society	8 国際会議録 Electrochemical Studies on Ti/TiN Barrier Layer CMP Chathapuram, V., Sundarain, K., Du, T., Tamboli, D., Desai, V. Electrochemical Society
3 国際会議録 Comparison of the Ti/TiN/AlCu/TiN stack with TiN/AlCu/Ti/TiN stack for application in ULSI metallization Menon,S.S., Choudhury,R.K. SPIE-The International Society for Optical Engineering	9 国際会議録 Effect of Ar Sputtering Pretreatment on the Electromigration Resistance in Al-Cu/TiN/Ti Interconnects Wang, L. P., Chuang, A., Lin, L. T., Huang, F. S., Perng, K., Hwang, J. MRS - Materials Research Society
4 国際会議録 In-Situ Oxygen Plasma Enhancement for Coherent Ti/TiN Barrier Metal Application Lee, K.-B., Kwak, N.-J., Kim, S.-D., Kim, C.-T., Fu, J., Nahm, M.K., Diaz, R., Lai, C.S., Xu, Z., Han, B.B., Park, … Electrochemical Society	10 国際会議録 OPTIMIZATION OF A TiN/TiSi2 p+ DIFFUSION BARRIER PROCESS Lee, S. S., Galovich, C. S., Fuchs, K. P., Kwong, D,.L., Hirvoven, J., Huang, J. Materials Research Society
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6 国際会議録 Schottky Barrier Poly-Si Thin-Film Transistors with Nano-scale Channel Width Lin, H.-C., Lee, M.-H., Yeh, K.-L., Hou, F.-J., Wang, M.-F., Huang, F.-Y. Electrochemical Society	12 国際会議録 Characteristics of sol-gel-derived(Pb.Ca)Ti03 pyroelectric thin films Wang,C.-M., Chen,Y.-C., Huang,Y.-T., Kao,M.-C. SPIE - The International Society for Optical Engineering

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