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TEMPERATURE DEPENDENT EMISSIVITY MEASUREMENTS OF Si, SiO2/Si, AND HgCdTe

著者名:
Ravindra, N. M.
Tong, F. M.
Kosonocky, W. F.
Markham, J. R.
Liu, S.
Kinsella, K.
さらに 1 件
掲載資料名:
Rapid thermal and integrated processing III : symposium held April 4-7, 1994, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
342
発行年:
1994
開始ページ:
431
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992429 [1558992421]
言語:
英語
請求記号:
M23500/342
資料種別:
国際会議録

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