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Highly sensitive resist material for deep x-ray lithography

著者名:
Ehrfeld,W. ( Institut fur Microtechnik Mainz GmbH )
Hessel,V.
Lehr,H.
Lowe,H.
Schmidt,M.
Schenk,R.
さらに 1 件
掲載資料名:
Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3049
発行年:
1997
開始ページ:
650
終了ページ:
658
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424631 [0819424633]
言語:
英語
請求記号:
P63600/3049
資料種別:
国際会議録

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