ArF photoresist system using alicyclic polymer
- 著者名:
Park,J.-H. ( Korea Kumho Petrochemical Co.,Ltd. ) Kim,S.-J. Park,S.-Y. Lee,H. Jung,J.-C. Bok,C.-K. Baik,K.-H. - 掲載資料名:
- Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3049
- 発行年:
- 1997
- 開始ページ:
- 485
- 終了ページ:
- 491
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424631 [0819424633]
- 言語:
- 英語
- 請求記号:
- P63600/3049
- 資料種別:
- 国際会議録
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