Novel functional nortricyclene polymers and copolymers for 248-and 193-nm chemically amplified resists
- 著者名:
- Niu,Q.J. ( Univ.of California/Berkeley )
- Frechet,J.M.J.
- Okoroanyanwu,U.
- Byers,J.D.
- Willson,C.G.
- 掲載資料名:
- Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3049
- 発行年:
- 1997
- 開始ページ:
- 113
- 終了ページ:
- 123
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424631 [0819424633]
- 言語:
- 英語
- 請求記号:
- P63600/3049
- 資料種別:
- 国際会議録
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11
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