New single-layer positive photoresists for 193-nm photolithography
- 著者名:
Okoroanyanwu,U. ( Univ.of Texas at Austin ) Shimokawa,T. Byers,J.D. Medeiros,D.R. Willson,C.G. Niu,Q.J. Frechet,J.M.J. Allen,R.D. - 掲載資料名:
- Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3049
- 発行年:
- 1997
- 開始ページ:
- 92
- 終了ページ:
- 103
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424631 [0819424633]
- 言語:
- 英語
- 請求記号:
- P63600/3049
- 資料種別:
- 国際会議録
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