Simulated calculation of temperature rise in silicon material irradiated by high-power laser

Simulated calculation of temperature rise in silicon material irradiated by high-power laser

著者名:

Shen,Z. ( Nanjing Univ.of Science and Technology )
Lu,J.
Ni,X.

掲載資料名:

Laser Processing of Materials and Industrial Applications

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2888

発行年:

1996

開始ページ:

271

終了ページ:

275

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819422897 [0819422894]

言語:

英語

請求記号:

P63600/2888

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020279
シリーズID:	PA00000029
会議名:	Photonics China : Laser Processing of Materials and Industrial Applications
回次:	1996
会議開催地:	Beijing, China
会議開催年:	1996.11.06-1996.11.07

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