Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes
- 著者名:
Lim,S.-C. ( Samsung Electronics Co.,Ltd. ) Kye,J.-W. Woo,S.-G. Kim,S.-G. Kang,H.-Y. Han,W.-S. Koh,Y.-B. - 掲載資料名:
- Optical Microlithography IX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2726
- 発行年:
- 1996
- 巻:
- Part2
- 開始ページ:
- 516
- 終了ページ:
- 523
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421029 [0819421022]
- 言語:
- 英語
- 請求記号:
- P63600/2726
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
2
国際会議録
Fabrication of dense contact patterns using halftone phase-shifting mask with off-axis illumination
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
9
国際会議録
Fidelity comparison of island patterns with different types of illuminations and phase shift masks
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |