Improvement of resist pattern fidelity with partial attenuated phase-shift mask

Improvement of resist pattern fidelity with partial attenuated phase-shift mask

著者名:

掲載資料名:

Optical Microlithography IX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2726

発行年:

1996

巻:

Part2

開始ページ:

496

終了ページ:

507

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421029 [0819421022]

言語:

英語

請求記号:

P63600/2726

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00020263
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	1996 : 9th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1996.03.13-1996.03.15

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