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Method of easily extracting resist development parameters for lithography simulation

著者名:
Lucas,K.D. ( Motorola )
Ivin,V.V.
Kudrja,V.P.
Larin,D.Yu.
Makhviladze,T.M.
Medvedeva,M.G.
Rogov,A.A.
Verzunov,S.V.
Yang,D.C.
さらに 4 件
掲載資料名:
Optical Microlithography IX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2726
発行年:
1996
巻:
Part1
開始ページ:
348
終了ページ:
359
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421029 [0819421022]
言語:
英語
請求記号:
P63600/2726
資料種別:
国際会議録

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