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Atomic scale control of epitaxial growth and interface in oxide thin films for advanced oxide lattice engineering

著者名:
  • Yoshimoto, M. ( Research Laboratory of Engineering Materials, Tokyo Institue of Technology )
  • Maeda, T. ( Research Laboratory of Engineering Materials, Tokyo Institue of Technology )
  • Ohnishi, T. ( Research Laboratory of Engineering Materials, Tokyo Institue of Technology )
  • Lee, G.H. ( Research Laboratory of Engineering Materials, Tokyo Institue of Technology )
  • Koinuma, H. ( Research Laboratory of Engineering Materials, Tokyo Institue of Technology )
掲載資料名:
Epitaxial oxide thin films II : symposium held November 26-30, 1995, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
401
発行年:
1996
開始ページ:
21
終了ページ:
31
出版情報:
Pittsburgh, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558993044 [1558993045]
言語:
英語
請求記号:
M23500/401
資料種別:
国際会議録

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