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Low Voltage E-Beam Lithography with the Scanning Tunneling Microscope

著者名:
Marrian C. R. K.
Perkins F. K.
Brandow S. L.
Koloski T. S.
Dobisz E. A.
Calvert J. M.
さらに 1 件
掲載資料名:
Nanolithography : a borderland between STM, EB, IB, and X-ray lithographies
シリーズ名:
NATO ASI series. Series E, Applied sciences
シリーズ巻号:
264
発行年:
1994
開始ページ:
175
終了ページ:
188
総ページ数:
14
出版情報:
Dordrecht: Kluwer Academic Publishers
ISSN:
0168132X
ISBN:
9780792327943 [0792327942]
言語:
英語
請求記号:
N11482/264
資料種別:
国際会議録

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