High-power source and illumination system for extreme ultraviolet lithography
- 著者名:
Kubiak,G.D. ( Sandia National Labs. ) Bernardez,L.J. Krenz,K D. Replogle,W.C. Sweatt,W.C. Sweeney,D.W. Hudyma,R.M. Shields,H. - 掲載資料名:
- EUV, x-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3767
- 発行年:
- 1999
- 開始ページ:
- 136
- 終了ページ:
- 142
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819432537 [0819432539]
- 言語:
- 英語
- 請求記号:
- P63600/3767
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |