Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation:I
- 著者名:
Socha,R.J. ( National Semiconductor Corp. ) Petersen,J.S. Chen,J.F. Laidig,T.L. Wampler,K.E. Caldwell,R.F. - 掲載資料名:
- 18th Annual BACUS Symposium on Photomask Technology and Management
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3546
- 発行年:
- 1998
- 開始ページ:
- 617
- 終了ページ:
- 641
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819430076 [0819430072]
- 言語:
- 英語
- 請求記号:
- P63600/3546
- 資料種別:
- 国際会議録
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12
国際会議録
Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
SPIE-The International Society for Optical Engineering |