TiSi-nitride attenuating phase-shift photomask for 193-nm lithography
- 著者名:
Reynolds,G.A.M. ( DuPont Central Research & Development ) French,R.H. Carcia,P.F. Torardi,C.C. Hughes,G.P. Jones,D.J. Lemon,M.F. Reilly,M. Wilson,L. Miao,C.R. - 掲載資料名:
- 18th Annual BACUS Symposium on Photomask Technology and Management
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3546
- 発行年:
- 1998
- 開始ページ:
- 514
- 終了ページ:
- 523
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819430076 [0819430072]
- 言語:
- 英語
- 請求記号:
- P63600/3546
- 資料種別:
- 国際会議録
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9
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