High-contrast positive resists for e-beam mask making

High-contrast positive resists for e-beam mask making

著者名:

Huang,W.-S. ( IBM Microelectronics Div. )

掲載資料名:

18th Annual BACUS Symposium on Photomask Technology and Management

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3546

発行年:

1998

開始ページ:

400

終了ページ:

408

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819430076 [0819430072]

言語:

英語

請求記号:

P63600/3546

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019916
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual Symposium on Photomask Technology and Management
回次:	1998 : 18th
会議開催地:	Redwood City, California, USA
会議開催年:	1998.09.16-1998.09.18

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