Size matters:defect detectability in reticle and wafer inspection including advanced aerial image simulation for defect printability
- 著者名:
Almog,E. ( Applied Materials ) Caldwell,R.F. Chang,F.-C. Chen,J.F. Farrar,N.R. Karklin,L. Laidig,T.L. Sabouri,S. Shen,W.P. Staud,W. Wu,C. Zelenko,J. - 掲載資料名:
- 18th Annual BACUS Symposium on Photomask Technology and Management
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3546
- 発行年:
- 1998
- 開始ページ:
- 139
- 終了ページ:
- 144
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819430076 [0819430072]
- 言語:
- 英語
- 請求記号:
- P63600/3546
- 資料種別:
- 国際会議録
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