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Thermal Studies on Stress-Induced Void-Like Defects in Epitaxial-CoSi2 Formation

著者名:
Ho, C. S.
Pey, K. L.
Tung, C. H.
Tee, K. C.
Prasad, K.
Saigal, D.
Tan, J. J. L.
Wong, H.
Lee, K. H.
Osipowicz, T.
Chua, S. J.
Karunasiri, R. P. G.
さらに 7 件
掲載資料名:
Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
564
発行年:
1999
開始ページ:
109
出版情報:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994713 [1558994718]
言語:
英語
請求記号:
M23500/564
資料種別:
国際会議録

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