Critical Length and Resistance Saturation Effects in Al(Cu) Interconnects
- 著者名:
Gall,M. Muller, J. Jawarani, D. Capasso, C. Hernanndez, R. Kawasaki, H. - 掲載資料名:
- Materials reliability in microelectronics VIII : symposium held April 13-16, 1998, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 516
- 発行年:
- 1998
- 開始ページ:
- 231
- 出版情報:
- Pittsburgh, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558994225 [155899422X]
- 言語:
- 英語
- 請求記号:
- M23500/516
- 資料種別:
- 国際会議録
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11
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Kinetics of Cu Segregation in Al-Cu(1 at.% Cu) Interconnects Studied by Resistance Measurements
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