Thermal Stability of a-C:F,H Films Deposited by Electron Cyclotron-Resonance Plasma Enhanced Chemical Vapor Deposition

Thermal Stability of a-C:F,H Films Deposited by Electron Cyclotron-Resonance Plasma Enhanced Chemical Vapor Deposition

著者名:

Theil, Jeremy A.

掲載資料名:

Low-dielectric constant materials III : symposium held April 1-4, 1997, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

476

発行年:

1997

開始ページ:

31

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993808 [1558993800]

言語:

英語

請求記号:

M23500/476

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019841
シリーズID:	PA00000011
会議名:	Symposium on low-dielectric constant materials
回次:	3rd
会議開催地:	San Francisco, CA, USA
会議開催年:	1997.04.01-1997.04.04

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