Chemical Bonding of Fluorine Atoms in SiOF Alloys: Microscopic Mechanisms for Reductions in the Dielectric Constant Relative to SiO2
- 著者名:
- 掲載資料名:
- Low-dielectric constant materials II : symposium held December 2-3, 1996, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 443
- 発行年:
- 1997
- 開始ページ:
- 111
- 出版情報:
- Pittsburgh, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558993471 [1558993479]
- 言語:
- 英語
- 請求記号:
- M23500/443
- 資料種別:
- 国際会議録
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10
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Bonded Hydrogen Atom Participation in Metastable Defect Formation in Hydrogenated Amorphous Silicon
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