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Temperature Dependence and Annealing Behaviour of Hf Implanted (100)Si: HfSi2 Synthesis

著者名:
Silva, M. R. da
Melo, A. A.
Soares, J. C.
Silva, M. F. da
Moons, R.
Langouche, G.
Vantomme, A.
Conde, O.
Lu, Y-C.
Kung, H.
さらに 5 件
掲載資料名:
Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
402
発行年:
1996
開始ページ:
593
出版情報:
Pittsburgh: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993051 [1558993053]
言語:
英語
請求記号:
M23500/402
資料種別:
国際会議録

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