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Morphologies and Growth Modes of FeSi and β-FeSi2 Layers Prepared by Rapid Thermal Annealing

著者名:
Amesz, P. H.
Jorgensen, L. V.
Libezny, M.
Poortmans, J.
Nijs, J.
Veen, A. van
Schut, H.
Hosson, J. Th. M. de
さらに 3 件
掲載資料名:
Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
402
発行年:
1996
開始ページ:
373
出版情報:
Pittsburgh: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993051 [1558993053]
言語:
英語
請求記号:
M23500/402
資料種別:
国際会議録

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