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Three-dimensional electron-beam lithography simulation

著者名:
Mack,C.A. ( FINLE Technologies )  
掲載資料名:
Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3048
発行年:
1997
開始ページ:
76
終了ページ:
88
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424624 [0819424625]
言語:
英語
請求記号:
P63600/3048
資料種別:
国際会議録

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