Toward sub-0.1-ヲフm CD measurements using scatterometry
- 著者名:
- Minhas,B.K. ( Univ.of New Mexico )
- Prins,S.L.
- Naqvi,S.S.H.
- McNeil,J.R.
- 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2725
- 発行年:
- 1996
- 開始ページ:
- 729
- 終了ページ:
- 739
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421012 [0819421014]
- 言語:
- 英語
- 請求記号:
- P63600/2725
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |