Multiparameter CD measurements using scatterometry
- 著者名:
Raymond,C.J. ( Univ.of New Mexico ) Murnane,M.R. Prins,S.L. Naqvi,S.S.H. McNeil,J.R. Hosch,J.W. - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2725
- 発行年:
- 1996
- 開始ページ:
- 698
- 終了ページ:
- 709
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421012 [0819421014]
- 言語:
- 英語
- 請求記号:
- P63600/2725
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |