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Measurement of a CD and sidewall angle artifact with two-dimensional CD AFM metrology

著者名:
Dixson,R. ( National Institute of Standards and Technology )
Sullivan,N.T.
Schneir,J.
McWaid,T.H.
Tsai,V.W.
Prochazka,J.J.
Young,M.
さらに 2 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography X
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2725
発行年:
1996
開始ページ:
572
終了ページ:
588
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421012 [0819421014]
言語:
英語
請求記号:
P63600/2725
資料種別:
国際会議録

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